发明名称 PLASMA TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus for stably keeping generation of foreign objects to be small even in a long-term operation, by preventing contamination of heavy metals from a plasma treatment chamber, preventing a deposition film on a wall surface that is not exposed to plasma from being peeled easily, facilitating the removal of the deposition film after certain operation, and at the same time improving corrosion resistance to a corrosive gas. SOLUTION: In the plasma treatment apparatus for generating plasma in a vacuum container and for treating surface of a sample by the generated plasma, at least one portion of the vacuum container is formed by a stainless steel material, and a portion in contact with plasma in the vacuum container is covered with an inner cover made of a conductive material that differs from the stainless steel material. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003243372(A) 申请公布日期 2003.08.29
申请号 JP20020040753 申请日期 2002.02.18
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 KAWAHARA HIRONORI;KANEKIYO HIROSHI;FUJIMOTO TETSUO;FURUSE MUNEO;SHICHIDA HIROYUKI
分类号 C23C16/44;H01L21/3065;(IPC1-7):H01L21/306 主分类号 C23C16/44
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