发明名称 SEMICONDUCTOR LIGHT EMITTING ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To improve an emission intensity in a semiconductor light emitting element of the structure in which electrodes for applying a bias to an n-type region and a p-type region of a light emitting semiconductor layer are formed at the same surface side of a supporting substrate. <P>SOLUTION: A first conductivity type first contact layer 2 is stacked on the support substrate 1. A light emitting semiconductor layer 3 having a light emitting junction 33 formed in a boundary between a first conductivity type clad 31 and a second conductivity type clad 32 arranged at lower and upper sites is formed on the layer 2. A second conductivity type second contact layer 4 is laminated on the layer 3. An exposure region 21 on the surface is formed to be surrounded by the layer 3 is formed on the layer 2, and a first electrode 5 is formed at an equal distance to the layer 3 on the region 21. A second electrode 6 is formed to surround the region 2 at a predetermined distance from the boundary A between the region 21 and the layer 3 on the layer 4. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003243709(A) 申请公布日期 2003.08.29
申请号 JP20020039239 申请日期 2002.02.15
申请人 MATSUSHITA ELECTRIC WORKS LTD 发明人 YASUDA MASAHARU;TAKAKURA NOBUYUKI;KUZUHARA KAZUNARI;HAYAZAKI YOSHIKI;NAGAHAMA HIDEO
分类号 H01L29/41;H01L33/14;H01L33/32;H01L33/38;H01L33/62 主分类号 H01L29/41
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