发明名称 |
SEMICONDUCTOR LIGHT EMITTING ELEMENT |
摘要 |
<P>PROBLEM TO BE SOLVED: To improve an emission intensity in a semiconductor light emitting element of the structure in which electrodes for applying a bias to an n-type region and a p-type region of a light emitting semiconductor layer are formed at the same surface side of a supporting substrate. <P>SOLUTION: A first conductivity type first contact layer 2 is stacked on the support substrate 1. A light emitting semiconductor layer 3 having a light emitting junction 33 formed in a boundary between a first conductivity type clad 31 and a second conductivity type clad 32 arranged at lower and upper sites is formed on the layer 2. A second conductivity type second contact layer 4 is laminated on the layer 3. An exposure region 21 on the surface is formed to be surrounded by the layer 3 is formed on the layer 2, and a first electrode 5 is formed at an equal distance to the layer 3 on the region 21. A second electrode 6 is formed to surround the region 2 at a predetermined distance from the boundary A between the region 21 and the layer 3 on the layer 4. <P>COPYRIGHT: (C)2003,JPO |
申请公布号 |
JP2003243709(A) |
申请公布日期 |
2003.08.29 |
申请号 |
JP20020039239 |
申请日期 |
2002.02.15 |
申请人 |
MATSUSHITA ELECTRIC WORKS LTD |
发明人 |
YASUDA MASAHARU;TAKAKURA NOBUYUKI;KUZUHARA KAZUNARI;HAYAZAKI YOSHIKI;NAGAHAMA HIDEO |
分类号 |
H01L29/41;H01L33/14;H01L33/32;H01L33/38;H01L33/62 |
主分类号 |
H01L29/41 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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