| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a resist film thickness measuring method rich in traceability in a production line by using a measuring method which provides a method for outputting high reliability data in non-destructively, and to provide the application method of the resist film. <P>SOLUTION: The measuring method enables the output of a conversion value as a resist film thickness value by converting a weight difference between a substrate weight before resist application and a substrate weight after resist application into the film thickness by using a data table for converting a target film thickness and the weight difference of a resist solution registered in advance when the resist solution is applied. Next, an application method is given by which an application amount of the resist solution is finely adjusted and applied by a feedback means of a previously registered film thickness value and an application amount modification means by using the measuring method. <P>COPYRIGHT: (C)2003,JPO</p> |
