| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a reflecting mask capable of preventing transfer failure caused by sticking of dirts. <P>SOLUTION: The reflecting mask comprises a substrate 1, an X-ray reflecting multilayer film 2 formed on the substrate 1, and an absorber layer 3 of a material of low X-ray transmissivity which is formed on it and has a prescribed pattern. A protection layer 4 of photocatalyst material is formed between the X-ray reflecting multilayer film 2 and the absorber layer 3. Thanks to the reflecting mask, contaminants on the mask surface are removed by optical radiation, etc., in an oxygen-contained atmosphere. <P>COPYRIGHT: (C)2003,JPO</p> |
