| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an aligner by which the foot print of the apparatus is significantly reduced. <P>SOLUTION: The aligner comprises an Rθstage 13 for a mask on which a mask 12 is mounted and an Rθstage 16 for a wafer on which a wafer 15 is mounted. The Rθstage for a mask is provided with a first polar coordinate drive system for driving a mask in one axial direction and rotating it with its axial center as the center. The Rθstage for a wafer is provided with a second polar coordinate drive system for driving the wafer in the one axial direction and rotating it with its axial center as the center. <P>COPYRIGHT: (C)2003,JPO</p> |
