发明名称 LASER BEAM IRRADIATING DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To solve the problem that, when a size of a substrate to be treated becomes larger, a foot print (a planar area required for treatment) of a laser beam irradiating device which moves a stage on which the substrate is set up in the X- or Y-direction becomes remarkably larger proportionally to the substrate, resulting in a huge size of the whole body of a device. <P>SOLUTION: A laser beam irradiating device scans a semiconductor film by projecting a laser beam upon the film by means of a galvano-mirror or polygon mirror. In addition, the device maintains an incident angleθof the laser beam to the semiconductor film at a certain angle when the device projects the laser beam upon the film. <P>COPYRIGHT: (C)2003,JPO</p>
申请公布号 JP2003243321(A) 申请公布日期 2003.08.29
申请号 JP20020349472 申请日期 2002.12.02
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 TANAKA KOICHIRO
分类号 G02B26/10;B23K26/04;B23K101/40;H01L21/20;H01L21/268;H01L21/336;H01L29/786;(IPC1-7):H01L21/268 主分类号 G02B26/10
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