| 摘要 |
PROBLEM TO BE SOLVED: To provide an ellipsometry in which the measurement of the thickness and the cross-sectional shape of a film formed on multilayer wiring can be carried out nondestructively with a high throughput. SOLUTION: A layer B composed of a metal wiring 302 and an interlayer insulation film 303, and a layer D composed of a metal wiring 304 formed perpendicularly to the metal wiring 302 and an interlayer insulation film 305 are formed beneath an oxide film 301. Assuming that a s polarization component of incident light is reflected on the interface of the layer B and a p polarization component is reflected on the interface of the layer D, amplitude reflectivities Rs and Rp thereof are calculated, tanΨand cosΔwhich are functions of the amplitude ratioΨand the phase differenceΔof the s polarization component and the p polarization component are calculated in order to obtain reference data, and then the thickness (tA) of the oxide film 301 is determined based on the reference data. COPYRIGHT: (C)2003,JPO
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