发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS AND MAINTENANCE METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing apparatus and a maintenance method capable of easily conducting the maintenance of the apparatus. SOLUTION: The apparatus is provided with a semiconductor treatment device 1 formed by modularizing a load lock chamber, a conveying chamber and a reaction chamber; a main frame 31; an independent chamber frame 32 for mounting the semiconductor treatment device; a sliding mechanism for smoothly and detachably mounting the chamber frame one main frame; and a positioning mechanism for fixing a position of the chamber frame in the main frame. The modularized semiconductor manufacturing apparatus is installed detachably in the main frame. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003243481(A) 申请公布日期 2003.08.29
申请号 JP20020044928 申请日期 2002.02.21
申请人 ASM JAPAN KK 发明人 YAMAGISHI TAKAYUKI;SUWADA MASAE;WATABE TSUYOSHI
分类号 H01L21/677;H01L21/00;H01L21/02;(IPC1-7):H01L21/68 主分类号 H01L21/677
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