发明名称 |
SEMICONDUCTOR MANUFACTURING APPARATUS AND MAINTENANCE METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing apparatus and a maintenance method capable of easily conducting the maintenance of the apparatus. SOLUTION: The apparatus is provided with a semiconductor treatment device 1 formed by modularizing a load lock chamber, a conveying chamber and a reaction chamber; a main frame 31; an independent chamber frame 32 for mounting the semiconductor treatment device; a sliding mechanism for smoothly and detachably mounting the chamber frame one main frame; and a positioning mechanism for fixing a position of the chamber frame in the main frame. The modularized semiconductor manufacturing apparatus is installed detachably in the main frame. COPYRIGHT: (C)2003,JPO |
申请公布号 |
JP2003243481(A) |
申请公布日期 |
2003.08.29 |
申请号 |
JP20020044928 |
申请日期 |
2002.02.21 |
申请人 |
ASM JAPAN KK |
发明人 |
YAMAGISHI TAKAYUKI;SUWADA MASAE;WATABE TSUYOSHI |
分类号 |
H01L21/677;H01L21/00;H01L21/02;(IPC1-7):H01L21/68 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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