发明名称 Semiconductor device and method for fabricating the same
摘要 A semiconductor device has an active region composed of a group III-V nitride semiconductor and ohmic electrodes and a gate electrode each formed on the active region. The active region has an entire surface thereof exposed to a plasma such that a surface potential for electrons therein is lower than in the case where the entire surface is not exposed to the plasma.
申请公布号 US2003160269(A1) 申请公布日期 2003.08.28
申请号 US20030372079 申请日期 2003.02.25
申请人 发明人 INOUE KAORU;IKEDA YOSHITO;HIROSE YUTAKA;NISHII KATSUNORI
分类号 H01L21/338;H01L29/20;H01L29/778;H01L29/812;(IPC1-7):H01L29/76 主分类号 H01L21/338
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