发明名称 |
Photolithographic molecular fluorine laser system |
摘要 |
The invention provides a two-stage laser mode of photolithographic molecular fluorine laser system for matching the center wavelength of an oscillation-stage laser to the center wavelength of an amplification-stage laser, thereby oscillating a laser beam having a low spectral purity and a narrow linewidth. The laser system is of the two-stage mode comprising an oscillation-stage laser 10 and an amplification-stage mode 20. The center wavelength of a laser beam emitted out of the oscillation-stage laser 10 is compared with and substantially matched to the center wavelength of a laser beam emitted out of the amplification-stage laser 20 when the latter is oscillated by itself.
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申请公布号 |
US2003161373(A1) |
申请公布日期 |
2003.08.28 |
申请号 |
US20020330966 |
申请日期 |
2002.12.27 |
申请人 |
KITATOCHI NAOKI;ARIGA TATSUYA;WAKABAYASHI OSAMU |
发明人 |
KITATOCHI NAOKI;ARIGA TATSUYA;WAKABAYASHI OSAMU |
分类号 |
G03F7/20;H01L21/027;H01S3/131;H01S3/134;H01S3/22;H01S3/23;(IPC1-7):H01S3/22;H01S3/223;H01S3/08 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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