发明名称 Photolithographic molecular fluorine laser system
摘要 The invention provides a two-stage laser mode of photolithographic molecular fluorine laser system for matching the center wavelength of an oscillation-stage laser to the center wavelength of an amplification-stage laser, thereby oscillating a laser beam having a low spectral purity and a narrow linewidth. The laser system is of the two-stage mode comprising an oscillation-stage laser 10 and an amplification-stage mode 20. The center wavelength of a laser beam emitted out of the oscillation-stage laser 10 is compared with and substantially matched to the center wavelength of a laser beam emitted out of the amplification-stage laser 20 when the latter is oscillated by itself.
申请公布号 US2003161373(A1) 申请公布日期 2003.08.28
申请号 US20020330966 申请日期 2002.12.27
申请人 KITATOCHI NAOKI;ARIGA TATSUYA;WAKABAYASHI OSAMU 发明人 KITATOCHI NAOKI;ARIGA TATSUYA;WAKABAYASHI OSAMU
分类号 G03F7/20;H01L21/027;H01S3/131;H01S3/134;H01S3/22;H01S3/23;(IPC1-7):H01S3/22;H01S3/223;H01S3/08 主分类号 G03F7/20
代理机构 代理人
主权项
地址