发明名称 DRYING RESIST WITH A SOLVENT BATH AND SUPERCRITICAL CO2
摘要 <p>A method (10) for drying an object having a polymeric film, wherein the object is submerged in a rinse liquid. The object is removed from the rinse liquid (20) and the object is placed in a solvent bath (20) before a sufficient amount of the rinse liquid can evaporate from the object (20). The density of a solvent in the solvent bath depends on a direction of orientation of the polymeric film with respect to a force. The object is removed from the solvent bath (30). A drying process is performed (40).</p>
申请公布号 WO2003070846(P1) 申请公布日期 2003.08.28
申请号 US2003004698 申请日期 2003.02.14
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