发明名称 Optical metrology target design for simultaneous measurement of multiple periodic structures
摘要 An optical metrology target is provided and has a first periodic structure and a second periodic structure. The first periodic structure has at least two features and a first pitch, and the second periodic structure has at least two features and a second pitch. The optical metrology target is illuminated with a light source, and an optical signal from the optical metrology target is received and analyzed.
申请公布号 US2003160163(A1) 申请公布日期 2003.08.28
申请号 US20020083877 申请日期 2002.02.25
申请人 WONG ALAN;CAO GARY X.;EISERER REX 发明人 WONG ALAN;CAO GARY X.;EISERER REX
分类号 G02B27/46;(IPC1-7):H01J3/14 主分类号 G02B27/46
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