| 摘要 |
1. A device to produce an incision into matter using plasma, comprising means for generating an electromagnetic waveform, means for feeding it into a transmitter incising electrode tip, means for sustaining said plasma cloud surrounding said electrode tip created by activating atomic particles along the interface of incising electrode tip and said matter to be incised. 2. The device of claim 1, characterized in that said means for generating an electromagnetic waveform comprises a radiofrequency signal generator. 3. The device of claim 1, characterized in that said means for generating an electromagnetic waveform comprises means for linking a propagation of a radiofrequency waveform through a signal gate to a burst mode duty cycle generator. 4. The device of claim 1, characterized in that said means for generating an electromagnetic waveform provides for producing a continuous waveform of electromagnetic radiation. 5. The device of claim 3, characterized in that comprises a power amplifier channeled through said signal gate involves a power amplifier with fixed or variable gain. 6. The device of claim 1, characterized in that said means for generating an electromagnetic waveform comprises means for channeling said amplified electromagnetic waveform through said impedance matching and output conditioning network which conditions and adjusts transmitted signal characteristics such as impedance in order to maximize signal transmission from said transmitter incising electrode tip and thereby minimize signal reflectance back into said device. 7. The device of claim 1, characterized in that said means for generating an electromagnetic waveform is channeled through a wave guide and with said incising electrode tip. 8. The device of claim 1, characterized in that said incising electrode tip is preferably a solid tip design but may also be hollow or semi-hollow. 9. The device of claim 1, characterized in that said incising electrode tip is a preferably linear or substantially curvilinear shaped design. 10. The device of claim 1, characterized in that said means for generating an electromagnetic waveform comprises means for impedance matching, frequency matching, power matching and tuning said radiant electromagnetic field to said plasma coating. 11. The device of claim 1, characterized in that said means for generating an electromagnetic waveform comprises means for matching system output power, said electromagnetic waveform frequency in order to substantially tune said plasma incising device to said atomic particles along said surface of said incising electrode tip. 12. The device of claim 1, characterized in that comprises means for controlling the distance between said atomic particles in said plasma cloud and said surface of said active transmitter incising electrode tip. 13. The device of claim 1, characterized in that comprises means for trapping and confining said plasma cloud around said incising electrode tip without a requirement for a solid matter confinement. 14. The device of claim 1, characterized in that comprises means for trapping, compressing, contouring, and controlling both shape and density of said plasma cloud around said incising electrode tip. 15. The device of claim 1, characterized in that comprises means for increasing energy density of said plasma cloud coating said incising electrode tip while decreasing both a cross sectional diameter of said plasma cloud and a width of said intended path of incision into said matter. 16. The device of claim 1, characterized in that comprises means for selectively varying said electromagnetic waveform characteristics such as said waveform frequency, and said system output power according to system requirements based on variations in said atomic particle characteristics comprising said plasma cloud such as said atomic particle precession, said atomic particle vibration, said atomic particle spin, and said atomic particle oscillation. |
