| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition having satisfactory transmittance when a source of light with 157 nm is used, having a wide defocus latitude, less liable to cause line edge roughness, free of concern for negative formation because a resist film is substantially thoroughly dissolved when developed with a developer and ensuring slight trailing of a line-and-space pattern. <P>SOLUTION: The positive resist composition comprises (A) a fluorine group- containing resin, which has a structure substituted with a fluorine atom in the main chain and/or side chain of polymer skeleton and a group that is decomposed by the action of an acid to increase solubility in an alkali developer and (B) an acid generator which generates an acid upon irradiation of an actinic ray or radiation, and the acid generator (B) is a sulfonium salt containing no aromatic ring or a compound having a phenacylsulfonium salt structure. <P>COPYRIGHT: (C)2003,JPO |
