| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition capable of forming a radiation-sensitive resin composition film thicker than plating and having high resolution. <P>SOLUTION: The radiation-sensitive resin composition comprises (A) an unsaturated group-containing alkali-soluble resin obtained by reacting 100 pts.wt. copolymer consisting of 1-40 wt.% constitutional units derived from a radical- polymerizable compound (a) having a carboxyl group, 1-50 wt.% constitutional units having a phenolic hydroxyl group derived from a radical-polymerizable compound (b-1) having a phenolic hydroxyl group or a radical-polymerizable compound (b-2) having a functional group convertible to a phenolic hydroxyl group after synthesis of the copolymer and the balance constitutional units derived from another radical-polymerizable compound (c) with 0.1-20 pts.wt. radical-polymerizable compound (d) having an epoxy group, (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation radical polymerization initiator. <P>COPYRIGHT: (C)2003,JPO |
