Group connection of reticle sub-shapes to reduce line shortening and improve pattern fidelity
摘要
The problem of line shortening which occurs during the photo lithographic processes can be reduced by dividing images on masks to be printed into multiple sub images. The sub images are spread to an optimized distance apart so that the printed image matches the original desired dimensions.
申请公布号
EP1150171(A3)
申请公布日期
2003.08.27
申请号
EP20010109861
申请日期
2001.04.23
申请人
INFINEON TECHNOLOGIES NORTH AMERICA CORP.;INTERNATIONAL BUSINESS MACHINES CORPORATION