发明名称 SILICON REFINING METHOD AND DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a silicon refining method and a device therefor capable of efficiently refining silicon. SOLUTION: The silicon refining device 1 is provided with a crucible 7, a charging means 5 for charging a raw material 2 including silicon with impurities and a slag agent for removing impurities into the crucible 7, an electromagnetic induction heating apparatus 8 for forming a molten liquid 6 by heating the raw material 2 and the slag agent 3, an agitation member 9 for agitating the molten liquid 6, and a gas blowout port 33 as a gas supply means. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003238138(A) 申请公布日期 2003.08.27
申请号 JP20020043448 申请日期 2002.02.20
申请人 SHARP CORP 发明人 FUKUYAMA TOSHIAKI;WADA KENJI;HAYAKAWA HISASHI
分类号 C01B33/037;(IPC1-7):C01B33/037 主分类号 C01B33/037
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