| 摘要 |
PURPOSE: A method is provided to reduce costs and achieve improved yield rate by eliminating a photo etching process in the formation of polymer organic film. CONSTITUTION: A method comprises the steps of forming a first electrode on a transparent insulation substrate(100) where a first pixel(Rp), a second pixel(Gp), and a third pixel(Bp) are defined; forming a diffusion prevention protrusion(102) on the first electrode; performing an oxygen plasma treatment on the surface of the substrate where the diffusion prevention protrusion is formed, and emitting a red light; permitting the convex portion of a stamp(106) to contact a first polymer organic film, and removing the convex portion through a lift-up process; performing a plasma treatment on the surface of the substrate where a first polymer organic film pattern remains, and forming a second polymer organic film which emits a green light; permitting the convex portion of the stamp to contact a second polymer organic film, and removing the convex portion through a lift-up process; forming first to third polymer organic film patterns for emitting red, blue and green lights; and forming a second electrode on the substrate where the first to third polymer organic film patterns are formed.
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