THINNER COMPOSITION FOR REMOVING PHOTOSENSITIVE RESIN COMPOSITION

摘要

PURPOSE: A thinner composition for removing a photosensitive resin composition is provided, to effectively remove the black resist adhered to the edge and back face of a glass substrate in short time and to reduce the step of interface. CONSTITUTION: The thinner composition comprises 1-50 parts by weight of propylene glycol monoalkyl ether; 50-99 parts by weight of alkyl ethanoate; 1-10 parts by weight of γ -butyrolactone; and 0.001-1 parts by weight of polyethylene oxide condensate of alkyl phenol as a surfactant. Also the thinner composition comprises 1-50 parts by weight of propylene glycol monoalkyl ether; 50-99 parts by weight of alkyl ethanoate; 1-10 parts by weight of γ -butyrolactone; and 0.001-1 parts by weight of linear-chained alkyl benzenesulfonic acid. Also the thinner composition comprises 1-50 parts by weight of propylene glycol monoalkyl ether; 50-99 parts by weight of alkyl ethanoate; 1-10 parts by weight of γ-butyrolactone; 0.001-1 parts by weight of polyethylene oxide condensate of alkyl phenol as a surfactant; and 0.001-1 parts by weight of linear-chained alkyl benzenesulfonic acid. Preferably the linear-chained alkyl benzenesulfonic acid is represented by the formula 1, wherein R is a linear alkyl group of C10-C14.