| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam lithography system which can perform stable exposure without causing dust to stick on respective elements (lens, electrode, etc.), of an electron beam emitting head part stored in an electron gun cylinder when the inner side of a vacuum chamber is put back to atmospheric pressure. SOLUTION: The electron beam lithography system which has the electron beam emitting head part stored in the electron gun cylinder and the vacuum chamber coupled with the electron beam emitting head part and irradiates a sample surface mounted in the vacuum chamber with an electron beam emitted from the electron gun of the electron beam emitting head part to write a fine uneven pattern on the sample surface includes a 1st inert gas injecting means which injects 1st inert gas into the electron gun cylinder and a 2nd inert gas injecting means which injects 2nd inert gas into the vacuum chamber; while the pressure in the electron gun cylinder is held higher than the pressure in the vacuum chamber, the 1st inert gas and 2nd inert gas are injected. COPYRIGHT: (C)2003,JPO
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