发明名称 PHOTOSENSITIVE MATERIAL DEVELOPMENT PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To maintain a processing capability by facilitating device maintenance and assuring sealing performance. SOLUTION: A washing tank 27 is freely attachably and detachably mounted with a partition 42. The partition 42 is freely attachably and detachably mounted with a submerged squeezing section 45. A groove 72 is formed on a contact surface 71 with washing tank 27 of the partition 42. The groove 72 is fitted with a sealing member 73. The sealing member 73 is pressed and crushed by a flat surface 46a in the state of mounting the partition 42 on the washing tank 27, by which the intrusion of the washing liquid between the washing tanks is prevented. The maintenance of the submerged squeezing section 45 can be carried out by removing the partition 42 from the washing tank 27. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003241353(A) 申请公布日期 2003.08.27
申请号 JP20020035954 申请日期 2002.02.13
申请人 FUJI PHOTO FILM CO LTD 发明人 NOGUCHI TOSHIHIRO
分类号 G03D3/00;F16J15/10;G03D3/08;(IPC1-7):G03D3/00 主分类号 G03D3/00
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