| 摘要 |
<p>A light absorptive antireflector comprising a substrate (20), a light absorbing film consisting essentially of a nitride of titanium (21), in which oxygen is present, formed on the substrate (20) and a silica film (23) formed on the light absorbing film, to reduce reflection of incident light from the silica film (23) side, wherein the geometrical film thickness of the light absorbing film is from 5 to 25 nm, and the geometrical film thickness of the silica film (23) is from 70 to 110 nm, wherein the film consisting essentially of a nitride of titanium (29) is a film containing oxygen in an amount of at most 0.5 as an atomic ratio to the titanium. <IMAGE></p> |
