| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemical amplification type positive resist composition which ensures small surface roughness and line edge roughness during etching and has excellent resolution and a wide focal-depth range and to provide a method of forming a resist pattern using the same. <P>SOLUTION: The positive resist composition is produced which comprises a resin ingredient (A) which has ester side chains having an acid-dissociating dissolution-inhibitive group containing a polycyclic group and has structural units derived from a (meth)acrylic ester in the main chain and which comes to have enhanced alkali solubility by the action of an acid, an acid generator ingredient (B) which generates an acid upon exposure to light and an organic solvent (C), wherein the ingredient (A) has both structural units derived from a methacrylic ester and structural units derived from an acrylic ester. <P>COPYRIGHT: (C)2003,JPO |
