发明名称 HIGH-FREQUENCY GLOW DISCHARGE EMISSION SPECTROMETRIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a high-frequency glow discharge emission spectrometric apparatus capable of performing measurement after a glow discharge is started. SOLUTION: A high-frequency power is oscillated by a high-frequency power source 5, the power is amplified, impedance is made to match with a ramp 1 by a matching part 6, and applied between the sample side electrode 1d and an anode 3b of the ramp 1. In the ramp 1, a pressure is reduced by a vacuum pump 3, argon gas is fed, the glow discharge is generated, the generated ions collide with a sample 4, the sample 4 is sputtered, excited to emit light in the plasma and the light is spectrally separated by a spectroscope 9. Meanwhile, a detector 7 detects a bias potential generated at a sample side electrode 1d at the discharge time, the presence or absence of the glow discharge is judged by the potential. The measurement of a data processing part 10 is started via a controller 8, and its result is displayed on a display part 11. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003240717(A) 申请公布日期 2003.08.27
申请号 JP20020037691 申请日期 2002.02.15
申请人 SHIMADZU CORP 发明人 FUJITA HIROYUKI
分类号 G01N21/67;(IPC1-7):G01N21/67 主分类号 G01N21/67
代理机构 代理人
主权项
地址
您可能感兴趣的专利