发明名称 METAL VAPOR DEPOSITION APPARATUS
摘要 PROBLEM TO BE SOLVED: To continuously and stably feed a raw metal for a long time in metal vapor deposition, to prevent any splash, and to prevent functional losses caused by melting damage of a feed port and metal deposition. SOLUTION: In a vacuum vapor deposition method in which raw metal pellets are fed into a crucible through a feed passage, the raw metal is irradiated with electronic beam in the crucible, and heated to vaporize the metal, and the vaporized metal is vapor-deposited on a base body, the raw pellets are fed via an auxiliary material feeder having a shielding function, the raw metal pellets are effectively guided to the crucible, the splash is prevented, the functional losses caused by melting damage and metal deposition by keeping the feed port away from the high temperature in the vicinity of the surface of the molten metal, and the metal can be stably vapor-deposited for a long time in a metal vapor deposition apparatus. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003239066(A) 申请公布日期 2003.08.27
申请号 JP20020039778 申请日期 2002.02.18
申请人 TDK CORP 发明人 TANABE YOSHIHIKO;TAKAI MITSURU
分类号 C23C14/24;G11B5/85;(IPC1-7):C23C14/24 主分类号 C23C14/24
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