| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and a method for stereo lithography capable of forming a mask and thereby erasing the mask with a simple constitution. SOLUTION: The apparatus for stereo lithography comprises a forming means 9 for forming the mask by thermally transferring an ink having a light opacity to a thick plate-like translucent member according to stereo lithography data, an exposure means 11 for exposing an uncured resin layer of a photosetting resin layer via the mask, an erasing means 19 for erasing the ink formed on the thick plate-like translucent member, and a control means for repeatedly operating the respective means. COPYRIGHT: (C)2003,JPO
|
