| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a template for polishing for improving polishing efficiency compared with the prior art. <P>SOLUTION: The template 1 for polishing engages a polishing object 2 and polishes its surface. Its outer peripheral edge 8 is chamfered by about 20 to 70° in relation to polishing work surface 9. Thus, polishing slurry easily flows from the outer peripheral edge to the polishing work surface. A polishing cloth does not contact with an edge at the proximity region of the outer peripheral edge, so that occurrence of contamination by damage to the edge part and scratch through the polishing cloth can be prevented during the polishing of the polished material. <P>COPYRIGHT: (C)2003,JPO |
