| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and device for treating gas containing organic halide, with which no change in a decomposition rate takes place with time even in the case of long-term use and the gas containing organic halide is stably and highly efficiently decomposed. <P>SOLUTION: When the gas containing organic halide is treated by using thermal plasma generated around atmospheric pressure, the method and the device for treating the gas containing organic halide comprising mixing of the gas passing through a center part of the thermal plasma and the gas passing through a peripheral part thereof are applied. <P>COPYRIGHT: (C)2003,JPO |
