PHOTOCATALYST LITHOGRAPHY METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method of etching and denaturing the surface of an object to be treated to a prescribed pattern form or introducing a functional material thereto without applying a resist to the surface.

SOLUTION: The photocatalyst lithography method comprising opposing a planar transparent support having a photocatalyst layer on one surface opposite to the object to be treated side apart a spacing below 3 mm with the photocatalyst layer side of the support directed toward the object to be treated side; irradiating the other surface side of the support with UV rays or visible light; admitting the UV rays or the visible light into optical fibers from their other ends while opposing the photocatalyst layer disposed at one front end of one or a plurality of the optical fibers to the object to be treated apart a spacing below 3 mm to form active species by a photocatalyst reaction; and etching or denaturing the surface of the object to be treated in the prescribed patterns by these active species and the method of introducing the function material comprising bonding the functional material only to the denatured segments or non-denatured segments.

COPYRIGHT: (C)2003,JPO