| 摘要 |
<P>PROBLEM TO BE SOLVED: To form a coating film so as to thinly and evenly cover the entire region of an uneven efficient pattern on a substrate to be subjected to treatment. <P>SOLUTION: In the case the coating film is formed so as to cover the uneven efficient pattern region E of the substrate 1 having the efficient pattern region E, a surrounding part 3 is formed in the outside of the efficient pattern region E so as to surround the pattern region E by pattern formation on the substrate 1, and in such a situation, a coating film formation material is applied. <P>COPYRIGHT: (C)2003,JPO |
