发明名称 |
TREATMENT METHOD FOR ZINC OXIDE PHOTOCATALYST THIN FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for enhancing the photocatalytic activity of a zinc oxide photocatalyst thin film used for environmental purification and the like. SOLUTION: A highly-oriented zinc oxide thin film which is film-deposited on the surface of a base body and whose C-axis is perpendicular to a base plate is subjected to nitrogen radical treatment at 50 to 400°C temperature of the base body to enhance the photocatalytic activity of zinc oxide. For example, the highly-oriented zinc oxide thin film whose C-axis is perpendicular to the base plate is film-deposited on the surface of the base body by an MOCVD method and zinc oxide is irradiated with nitrogen radical using a radical source mounted on an MOCVD device. COPYRIGHT: (C)2003,JPO
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申请公布号 |
JP2003236376(A) |
申请公布日期 |
2003.08.26 |
申请号 |
JP20020044216 |
申请日期 |
2002.02.21 |
申请人 |
NATIONAL INSTITUTE FOR MATERIALS SCIENCE |
发明人 |
SAKAGUCHI ISAO;RI SUSUMU;HANEDA HAJIME;HISHIDA SHUNICHI;OHASHI NAOKI |
分类号 |
B01J23/06;B01J35/02;B01J37/02;C23C16/40;C23C16/56;(IPC1-7):B01J23/06 |
主分类号 |
B01J23/06 |
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