发明名称 POLISHING PAD AND POLISHING MACHINE WITH THE SAME AND USAGE OF POLISHING PAD
摘要 PROBLEM TO BE SOLVED: To provide a polishing pad, a polishing machine with the same and a usage of the polishing pad that removes stains by polishing the surface to which stains stick, can give sufficient glossiness and has biodegradability. SOLUTION: In the polishing pad, the parts in which adjoining fibers (plant fibers such as a sisal hemp or coconut fibers, human hair, animal fibers such as pig hair or the like for example) intersect are formed of rock-shaped fiber accumulations joined by an adhesive (a thermoplastic resin emulsion, a vinyl acetate resin adhesive, etc.). The polishing machine uses the polishing pad as a polishing material and can easily remove stains on a polished surface and give sufficient gloss. The usage of the polishing pad includes the polishing of a polished surface without using a cleaning agent or the like. The polishing pad does not require preparatory work such as a cleaning agent supply process or the like and exhibits a high degree of working efficiency. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003235774(A) 申请公布日期 2003.08.26
申请号 JP20020045126 申请日期 2002.02.21
申请人 TOYO CUSHION KK;JAPAN VILENE CO LTD 发明人 HIRAI MIYOKO;SUZUKI YUKIO;SHIKIBE KAZUO
分类号 A47L13/16;A47L13/02;(IPC1-7):A47L13/16 主分类号 A47L13/16
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