发明名称 DEVICE AND METHOD FOR FORMING COATING FILM, AND DEVICE AND METHOD FOR MANUFACTURING DISPLAY
摘要 <P>PROBLEM TO BE SOLVED: To provide a device and a method capable of forming a coating film having excellent uniformity while effectively preventing generation of bubbles. <P>SOLUTION: The device for forming the coating film has a spin chuck 2 for holding a substrate 1 having an irregular pattern area in a horizontal state, a spin motor 3 for rotating the substrate 1 held thereon, a nozzle 4 arranged in a state opposing to the substrate 1 held on the spin chuck 2 and a nozzle moving means 5 for moving the nozzle 4 in the horizontal direction, and is equipped with a supply means for a coating film forming material for supplying the coating film forming material from the nozzle 4 to a nearly whole area of the pattern areas of the substrate 1 and a control means for controlling driving conditions of a rotary drive means and the supply means for the coating film forming material. The coating film forming material is supplied to the nearly whole area of the pattern area of the substrate 1 by the drive of the supply means for the coating film forming material in a state that the substrate 1 held on the spin chuck 2 is stopped to rotate using the device for forming the coating film, then the substrate 1 is rotated by the drive of the spin motor 3. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003236441(A) 申请公布日期 2003.08.26
申请号 JP20020033582 申请日期 2002.02.12
申请人 SONY CORP 发明人 ISHIWATARI MIKA
分类号 G03F7/16;B05B13/02;B05C5/02;B05C11/08;B05C13/02;B05D1/40;B05D7/00;H01L21/027 主分类号 G03F7/16
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