发明名称 |
Dressing apparatus and polishing apparatus |
摘要 |
A dressing apparatus is used for dressing a polishing surface of a polishing table used for polishing a workpiece such as a semiconductor wafer. The dressing apparatus for dressing apparatus comprises a dresser having a dressing surface for dressing the polishing surface, and the dressing surface has an area which covers an entire area of the polishing surface. |
申请公布号 |
US6609962(B1) |
申请公布日期 |
2003.08.26 |
申请号 |
US20000572629 |
申请日期 |
2000.05.17 |
申请人 |
EBARA CORPORATION |
发明人 |
WAKABAYASHI SATOSHI;YAMAGUCHI KUNIAKI;TOGAWA TETSUJI;TAKADA NOBUYUKI;NABEYA OSAMU |
分类号 |
B24B53/02;B24B1/04;B24B37/00;B24B37/04;B24B53/00;B24B53/007;B24B53/017;B24B53/12;B24B55/06;H01L21/302;H01L21/304;(IPC1-7):B24B1/00 |
主分类号 |
B24B53/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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