发明名称 |
POLYCRYSTAL SEMICONDUCTOR FILM AND MANUFACTURING METHOD, AND MANUFACTURING DEVICE FOR SEMICONDUCTOR ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a method and a device for evaluating the quality of a polycrystal semiconductor film and forming a uniform polycrystal semiconductor film and a manufacturing method and a manufacturing device for a semiconductor element having the polycrystal semiconductor film. SOLUTION: At least one transmission rate measuring means for measuring the transmission rate of the semiconductor film and at least one reflection factor measuring means for measuring the reflection factor of the semiconductor film are provided. The transmission rate and the reflection factor of the semiconductor film are measured during or immediately after a laser anneal process. According to the result of the measurement, the quality of the semiconductor film is inspected and the feedback of result of the inspection to a laser light source is effected to control the laser anneal process. COPYRIGHT: (C)2003,JPO
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申请公布号 |
JP2003234288(A) |
申请公布日期 |
2003.08.22 |
申请号 |
JP20020030762 |
申请日期 |
2002.02.07 |
申请人 |
SONY CORP |
发明人 |
KASAI HIROTO;YAMANAKA HIDEO |
分类号 |
H01L21/66;H01L21/20;H01L21/26;H01L21/268;H01L21/336;H01L29/786;(IPC1-7):H01L21/20 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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