发明名称 THERMALLY DEVELOPABLE PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a thermally developable photosensitive material which suppresses fogging and is excellent in image preservability. SOLUTION: The thermally developable photosensitive material comprises a reducible silver salt, a catalytically active amount of a photocatalyst, a reducing agent, a binder and an antifoggant, wherein an aromatic trihalogenomethylsulfonyl derivative or a 2-(trihalogenomethylsulfonyl) anthraquinone is used as the antifoggant. An aromatic tribromomethylsulfonyl derivative is preferable as the aromatic trihalogenomethylsulfonyl derivative and 2-(tribromomethylsulfonyl)anthraquinone is preferable as the 2-(trihalogenomethylsulfonyl)anthraquinone. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003233152(A) 申请公布日期 2003.08.22
申请号 JP20020033435 申请日期 2002.02.12
申请人 SUMITOMO SEIKA CHEM CO LTD 发明人 FUJISAWA AKIYUKI;HIRAKO KAZUYOSHI;TAKEUCHI TAKESHI;SUZUKI MICHIO
分类号 G03C1/498;(IPC1-7):G03C1/498 主分类号 G03C1/498
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