| 摘要 |
PROBLEM TO BE SOLVED: To provide substrate treatment equipment capable of preventing adverse effects of having light as a catalyst at removal of an organic matter using a removing solution. SOLUTION: A substrate W with an organic matter such as a polymer or the like attached is accommodated in a chamber 65, and a removing solution is fed from a removing-solution nozzle 75 to remove the organic matter. The chamber 65 is constituted by using a light-blocking material that does not transmit light. Moreover, a carry-in/carry-out port 58 for carrying the substrate W in/out the chamber 65 is closed by a shutter 59, and the light to the chamber 65 is blocked. Furthermore, a lamp 15 is put out, and an observation port 21 for checking the inside of the chamber 65 from the exterior of the equipment is closed. Thereby, the inside of the chamber 65 can be made into a darkroom in removing the organic matter, and adverse effects of having light as a catalyst in removing the organic matter using the removing solution can be prevented. COPYRIGHT: (C)2003,JPO |
