| 摘要 |
PROBLEM TO BE SOLVED: To provide a failure analyzer by which a clear pattern image is acquired with satisfactory efficiency regarding a semiconductor device of various impurity concentrations. SOLUTION: The failure analyzer 1a for the semiconductor device incidentally illuminates the semiconductor device 7 from its rear side by using tunable light to capture a reflected light image. By using illumination light at different wavelengths, a contrast of the reflected light image is spectrally measured, and a wavelength at which the contrast of the reflected light image becomes maximum is found. The wavelength is selected automatically by a computer 4a. The computer 4a uses illumination light at the frequency so as to enable an imaging device 3a to capture the reflected light image, and it generates pattern image data by using imaging data. Since an optimum wavelength of the illumination light is decided on the basis of the contrast of the reflected light image, the clear pattern image can be acquired. COPYRIGHT: (C)2003,JPO
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