| 摘要 |
PROBLEM TO BE SOLVED: To improve the uniformity of temperature in a heat treatment device for heating a substrate. SOLUTION: This heat treatment device 1 is provided with an upper stage lamp group 41 turning toward a specified direction and a lower stage lamp group 42 vertically crossing with the upper stage lamp group 41. A lower reflector 122 is provided between the upper stage lamp group 41 and lower stage lamp group 42, and they are provided in a manner of reflecting lights emitted from the lamps on both end sides in the arrangement direction of the lower stage lamp group 42. Thus, reflected lights from the lower lamp group 42 can be efficiently given to the auxiliary ring 31, improving the uniformity of temperature when the substrate 9 is heated. COPYRIGHT: (C)2003,JPO
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