| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To easily specify a finish confirmation pattern and a designing value without using the field of a figure, letter or the like, upon finishing confirmation work in the manufacturing process of a semiconductor device. <P>SOLUTION: In the semiconductor device, on which contact hole forming areas 1a, 1b and 1c and arranged as finish confirmation patterns, a part of the finish confirmation pattern is used as a designing value specifying area 2 while the specifying of the designing value can be effected by changing the configuration, the number of pieces or the arrangement of the contact holes in the designing value specifying area 2. The contact holes are inspected whether they are finished in line with the designing value of the same or not by a method wherein sizes of the contact holes in the finish confirmation pattern are measured and the designing value specifying area 2 is consulted. <P>COPYRIGHT: (C)2003,JPO</p> |
