| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a semiconductor apparatus being position detecting channels by which an alignment mark can more easily and precisely recognized, and a manufacturing method for the semiconductor apparatus for overlaying patterns, using the position detecting channels. <P>SOLUTION: This semiconductor board includes an underlayer wire 13 on a base film 11, and a position detecting channels 15 indicating a reference position of the processing pattern as well as a contact hole 14 is pattern-formed on an interlayer insulation film 12 formed on the upper surface. This position detecting channel 15 is constructed such that a set of a plurality of bar type channels each with a different opening aperture width is provided with four sets along four sides of a square SQ. Then each of sets comprises three kinds of channels each with a different opening aperture, and these constructs the position detecting channel 15, being provided in turn from a wider one in a opening width, radially to each direction of four sides from a center of the square SQ. <P>COPYRIGHT: (C)2003,JPO</p> |
