发明名称 Thin film, method and apparatus for forming the same, and electronic component incorporating the same
摘要 A method for forming a thin film includes the steps of: supplying a deposition material in the form of a liquid onto a heated surface; heating and vaporizing the deposition material on the heated surface while the deposition material is undergoing movement; and depositing the deposition material onto a deposition surface. The deposition material is supplied onto a position of the heated surface where the vaporized deposition material does not reach the deposition surface.
申请公布号 US2003157742(A1) 申请公布日期 2003.08.21
申请号 US20030378693 申请日期 2003.03.04
申请人 HONDA KAZUYOSHI;ODAGIRI MASARU;TAKAHASHI KIYOSHI;ECHIGO NORIYASU;SUNAGARE NOBUKI 发明人 HONDA KAZUYOSHI;ODAGIRI MASARU;TAKAHASHI KIYOSHI;ECHIGO NORIYASU;SUNAGARE NOBUKI
分类号 B05B17/04;B05D7/24;C23C14/24;C23C14/56;G11B5/85;(IPC1-7):H01L23/58;H01L21/461 主分类号 B05B17/04
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