发明名称 |
Thin film, method and apparatus for forming the same, and electronic component incorporating the same |
摘要 |
A method for forming a thin film includes the steps of: supplying a deposition material in the form of a liquid onto a heated surface; heating and vaporizing the deposition material on the heated surface while the deposition material is undergoing movement; and depositing the deposition material onto a deposition surface. The deposition material is supplied onto a position of the heated surface where the vaporized deposition material does not reach the deposition surface.
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申请公布号 |
US2003157742(A1) |
申请公布日期 |
2003.08.21 |
申请号 |
US20030378693 |
申请日期 |
2003.03.04 |
申请人 |
HONDA KAZUYOSHI;ODAGIRI MASARU;TAKAHASHI KIYOSHI;ECHIGO NORIYASU;SUNAGARE NOBUKI |
发明人 |
HONDA KAZUYOSHI;ODAGIRI MASARU;TAKAHASHI KIYOSHI;ECHIGO NORIYASU;SUNAGARE NOBUKI |
分类号 |
B05B17/04;B05D7/24;C23C14/24;C23C14/56;G11B5/85;(IPC1-7):H01L23/58;H01L21/461 |
主分类号 |
B05B17/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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