发明名称 MANUFACTURING METHOD FOR SEMICONDUCTOR INTEGRATED CIRCUIT APPARATUS
摘要 At the time of performing resin molding for a matrix frame in the fabrication of semiconductor integrated circuit devices, a predetermined amount of air is fed into each of first cavities in a first row and second cavities in a second row, the first and second cavities being formed in a matrix arrangement in a lower mold of a molding die, so as to pressurize the interiors of the cavities, and a sealing resin is charged into the cavities, while the pressure therein is regulated in such a manner that the charging speeds of the sealing resin become equal in all of the cavities, whereby it is possible to stabilize the quality of the product being obtained.
申请公布号 KR20030068467(A) 申请公布日期 2003.08.21
申请号 KR20030009039 申请日期 2003.02.13
申请人 发明人
分类号 B29C45/26;H01L21/56;B29C45/00;B29C45/14;B29L31/34 主分类号 B29C45/26
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