发明名称 Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same
摘要 Provided are a fluorine-containing photosensitive polymer having a hydrate structure and a resist composition including the photosensitive polymer. The photosensitive polymer has an average molecular weight of about 3,000-100,000 with a repeating unit including a group having one of structural formulae below:
申请公布号 US2003157430(A1) 申请公布日期 2003.08.21
申请号 US20020264429 申请日期 2002.10.04
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 YOON KWANG-SUB;SONG KI-YONG;CHOI SANG-JUN;WOO SANG-GYUN
分类号 C08F12/14;C08F32/04;C08F32/08;C08F212/06;C08F220/10;C08F232/08;G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/038 主分类号 C08F12/14
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