发明名称 |
Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same |
摘要 |
Provided are a fluorine-containing photosensitive polymer having a hydrate structure and a resist composition including the photosensitive polymer. The photosensitive polymer has an average molecular weight of about 3,000-100,000 with a repeating unit including a group having one of structural formulae below:
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申请公布号 |
US2003157430(A1) |
申请公布日期 |
2003.08.21 |
申请号 |
US20020264429 |
申请日期 |
2002.10.04 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
YOON KWANG-SUB;SONG KI-YONG;CHOI SANG-JUN;WOO SANG-GYUN |
分类号 |
C08F12/14;C08F32/04;C08F32/08;C08F212/06;C08F220/10;C08F232/08;G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/038 |
主分类号 |
C08F12/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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