| 摘要 |
A method for manufacturing an organic semiconductor device including an organic electro-luminescent device composed of a plurality of pixels, which display high quality image information. Insulating film patterns composed of insulating materials having a lower optical damage threshold than the optical damage threshold of a substrate are formed between pixel elements on the substrate. Organic layers including a light-emitting organic layer and electrodes are formed on the substrate where the insulating films are formed. Focused laser beams are irradiated to entirely remove the organic layers and electrode materials formed on the insulating film patterns and remove the insulating film patterns partially or entirely in view of thickness and, thereby forming a plurality of pixels. The optical damage process using laser beam irradiation is performed under the vacuum, or non-moisture and non-oxygen inert gas flows, to prevent the devices from being contaminated by residual products. |
