发明名称 |
Coating method |
摘要 |
By optimizing the pressure condition for sucking up an excess of coating liquid with a recovering slit (32), a coating layer on a web (12) with a very small and even thickness can be obtained. In a coating method using two slits of a coating slit (30) and the recovering slit (32), a liquid pressure P (MPa) at a suction port (32A) of the recovering slit (32) is adjusted in a range of 0.05 > P ‰¥ 0. Thus, coating thickness variations in the web (12) width direction of the coating layer formed on the web (12) can be restrained, and score-like coating omission can be prevented from occurring on the coating layer surface.
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申请公布号 |
EP1336435(A2) |
申请公布日期 |
2003.08.20 |
申请号 |
EP20030003671 |
申请日期 |
2003.02.18 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
MANDAI, TOSHIHIRO;TOMARU, MIKIO;SHIBATA, NORIO |
分类号 |
B05D1/26;B05C5/02;B05C11/04;B05C11/10;B05D3/00;B05D7/00;G03C1/74;G11B5/842;G11B5/848;(IPC1-7):B05C5/02 |
主分类号 |
B05D1/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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