发明名称 |
Electrostatic lens systems for secondary-electron mapping-projection apparatus, and mapping-projection apparatus and methods comprising same |
摘要 |
Electron-optical systems are disclosed that are especially useful in mapping-projection electron microscopy and related uses. The systems achieve high magnification with excellent control of aberrations, and low magnification at wide optical fields with excellent control of aberrations.
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申请公布号 |
US6608308(B1) |
申请公布日期 |
2003.08.19 |
申请号 |
US20000580533 |
申请日期 |
2000.05.26 |
申请人 |
NIKON CORPORATION |
发明人 |
TAKAGI TORU;NISHIMURA HIROSHI |
分类号 |
G21K1/06;G21K7/00;H01J37/153;(IPC1-7):G21K7/00;G03C5/00 |
主分类号 |
G21K1/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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