发明名称 |
Method and apparatus for treating substrates |
摘要 |
A method and apparatus for treating substrates in a fluid container with at least one fluid and ultrasound provided. Each of two oppositely disposed walls of the fluid container are provided with at least two ultrasound radiation areas that can be respectively individually activated. The ultrasound radiation areas of one of the container walls is activated in a chronological relationship to the ultrasound radiation areas of the other container wall in such a way that oppositely disposed ultrasound radiation areas of the container walls are not activated simultaneously.
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申请公布号 |
US6607604(B1) |
申请公布日期 |
2003.08.19 |
申请号 |
US20000600084 |
申请日期 |
2000.06.30 |
申请人 |
STEAG MICROTECH GMBH |
发明人 |
OSHINOWO JOHN |
分类号 |
H01L21/304;B01J19/10;B08B3/12;H01L21/00;(IPC1-7):B08B3/12 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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