发明名称 Method and apparatus for treating substrates
摘要 A method and apparatus for treating substrates in a fluid container with at least one fluid and ultrasound provided. Each of two oppositely disposed walls of the fluid container are provided with at least two ultrasound radiation areas that can be respectively individually activated. The ultrasound radiation areas of one of the container walls is activated in a chronological relationship to the ultrasound radiation areas of the other container wall in such a way that oppositely disposed ultrasound radiation areas of the container walls are not activated simultaneously.
申请公布号 US6607604(B1) 申请公布日期 2003.08.19
申请号 US20000600084 申请日期 2000.06.30
申请人 STEAG MICROTECH GMBH 发明人 OSHINOWO JOHN
分类号 H01L21/304;B01J19/10;B08B3/12;H01L21/00;(IPC1-7):B08B3/12 主分类号 H01L21/304
代理机构 代理人
主权项
地址