Disclosed are dual chambered bubbler designs for use with solid organometallic source material for chemical vapor phase deposition systems, and a method for transporting a carrier gas saturated with source material for delivery into such systems.
申请公布号
US6607785(B2)
申请公布日期
2003.08.19
申请号
US20010870245
申请日期
2001.05.30
申请人
SHIPLEY COMPANY, L.L.C.
发明人
TIMMONS MICHAEL L.;COLBY RICHARD J.;STENNICK ROBERT S.
