| 摘要 |
A deposition system is used for depositing particles onto a substrate, such as a wafer in a deposition chamber. The particles are carried in an aerosol that is generated by an atomizer that includes an impaction plate for removing large particles before the aerosol is discharged, and which has an output that is provided through a particle classifier to the deposition chamber. Various branches of flow lines are used such that the aerosol that has classified particles in it, is mixed with a clean dry gas prior to discharge into the deposition chamber, and selectively the aerosol can be directed to the deposition chamber without having the particles classified. The lines carrying the aerosol can be initially connected to a vacuum source that will quickly draw the aerosol closely adjacent to the deposition chamber to avoid delays between deposition cycles.
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